Multibeam Corporation

About

Multibeam Corporation specializes in high-productivity electron beam lithography (EBL) systems, specifically the Multicolumn E-Beam Lithography platform. This technology is used for rapid prototyping and production of advanced semiconductor devices, including applications in advanced packaging, compound semiconductors, MEMS and sensors, photonics, and secure chip identification. The systems are capable of high precision patterning with resolutions below 50nm on 200mm wafers, and they support complex topographies and high-density interconnects. Multibeam's technology enables features such as adaptable patterning, high depth of focus, and the ability to handle non-planar surfaces, making it suitable for next-generation integrated circuits and quantum devices.