ProSys Inc. manufactures megasonic cleaning systems specifically designed for advanced wet process technology markets. Their products are utilized in various applications including front-end and back-end of line cleans, post-CMP and polish cleaning, mask cleaning, and photoresist develop/strip processes. The company specializes in single wafer cleaning technology, offering systems that can handle substrate sizes ranging from 75 mm to 450 mm. Their patented MegPieâ„¢ technology ensures high particle neutrality and greater than 99% particle removal efficiency (PRE) at 19 nm, making them suitable for semiconductor manufacturing and other precision cleaning applications.
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