Tempress

About

Tempress specializes in diffusion and deposition solutions for the semiconductor and advanced materials industry. They provide a variety of diffusion processes, including high temperature annealing (up to 1365°C), wet and dry oxidation, and doping with phosphorus and boron. Their deposition technologies include Low Pressure CVD (LPCVD), Plasma Enhanced CVD (PECVD), and Atomic Layer Deposition (ALD), which are used to produce high-quality thin films for applications in integrated circuits, MEMS, photonic devices, and photovoltaic systems. Tempress also offers a multipurpose thermal processing platform that supports a wide range of diffusion and deposition technologies.