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About
EHT Semi manufactures RF power systems specifically designed for plasma generation and control in semiconductor manufacturing. Their Orion Direct RF System eliminates the need for traditional matching networks, providing efficient and agile power modulation for precision plasma control. This system is suitable for applications such as inductively coupled plasma (ICP) and capacitively coupled plasma (CCP), with a power output of 5 kW and operating frequencies of 2 or 13.56 MHz. Additionally, their tailored waveform generators enhance ion energy distribution control at the wafer surface, supporting processes like atomic layer etching (ALE), atomic layer deposition (ALD), and high aspect ratio (HAR) etching.
Products & Services
Orion Direct RF Systemtailored waveform generators
Quick Facts
- Location
- Seattle, United States, United States
- Category
- Electronics Manufacturing
