STELA Materials Inc (SMI) (legal name is CSI2D. Inc) was founded to capitalize on new business opportunities within the semiconductor industry, particularly material science and two-dimensional (2D) substrates used for next generation manufacturing of semiconductor applications and industry applications for aerospace, computing and medical applications. SMI has created a unique process to build two-dimensional layers of numerous materials (Graphene, Arsenene, Gallium, and Silicene) on Silicon substrates (Si 111 or Si 112 or even SiC- Silicon Carbide). 2D “layers” on semiconductor substrates has tremendous benefits for microelectronics and materials applications. The immediate benefits are a 5,000% improvement of dialectric properties- so electrons run faster, cooler, with less energy. In short- “superconductive properties at room temperature”. To date, no other organization has been able to fabricate epitaxial 2D materials onto silicon substrates fast, cost-effectively, stable, and with a high-degree of repeatability (e.g. minimal waste). Since silicon is the base substrate for almost every electronic device, our process enables a simple way to increase the performance of many applications in many markets. Technology The world’s first 2D substrates on silicon are enabling a new era in semiconductors with significant increases in manufacturing speed, precision and affordability. These will be seen to catalyze device development for a wide range of next generation semiconductor implementations. 2D layers on silicon substrates represent a major evolutionary and developmental leap on the path to dramatically more efficient devices built on superior substrates. These materials enable the following features:
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